Cleaning base and cleaning system

A cleaning base comprising:

• a bottom frame, wherein a cleaning portion for cleaning at least a part of a floor cleaning device and a cleaning chamber for accommodating the floor cleaning device are formed inside the bottom frame,
• a water inlet pipeline fluidly connecting the cleaning portion with a water source;
• a water inlet valve arranged in the water inlet pipeline;
• and
• a pressure relief tank arranged in the water inlet pipeline and located downstream of the water inlet valve, wherein the pressure relief tank is configured to relieve a pressure and slow down flow of water downward along the water inlet pipeline from the water inlet valve to the cleaning portion, wherein:
• the pressure relief tank comprises a liquid inlet fluidly connected with a water outlet of the water inlet valve, a liquid outlet fluidly connected with the cleaning portion, and a feed inlet fluidly connected with a detergent canister, a height of the liquid inlet and a height of the feed inlet are higher than that of the liquid outlet,
• the water inlet pipeline comprises a first water inlet pipe and a second water inlet pipe, two ends of the first water inlet pipe are fluidly connected to the liquid inlet and the water outlet of the water inlet valve respectively, and two ends of the second water inlet pipe are fluidly connected to the liquid outlet and the cleaning portion respectively, and
• the cleaning base comprises a water discharge tank, a water discharge pump and a water supplementing pipeline, the water discharge pump and the water discharge tank are arranged in a water discharge pipeline, the water discharge pump is located downstream of the water discharge tank, two ends of the water supplementing pipeline are fluidly connected to the water discharge tank and the water inlet pipeline respectively.