Semiconductor device and method
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsSih-Hao Liao, Yu-Hsiang Hu, Hung-Jui Kuo, Chen-Hua Yu
Life of this patent
Estimating the term…
Abstract
A method of manufacturing a semiconductor device includes placing a polymer raw material mixture over a substrate. The polymer raw material may include a polymer precursor, a photosensitizer, and an additive. The polymer raw material mixture is exposed to radiation to form a dielectric layer and cured at a temperature of between about 150° C. and about 230° C.
Claims20
A method of manufacturing a semiconductor device, the method comprising:
- dispensing a mixture over a substrate, the mixture comprising:
- a polymer precursor;
- a photosensitizer;
- a cross-linker;
- and
- an additive, the additive comprising a first glycol;
- exposing the mixture to radiation;
- curing the mixture, the curing the mixture comprises increasing a cyclization in the mixture, the additive being a chemical catalyst during the curing the mixture;
- and
- forming a redistribution layer over the mixture.
A method of manufacturing a semiconductor device, the method comprising:
- forming a conductive feature over a substrate;
- forming a polymer layer over the conductive feature, the forming the polymer layer comprising:
- depositing a polymer raw material over the conductive feature, the polymer raw material comprising a polymer precursor, a photosensitizer, and an additive;
- patterning the polymer raw material to form the polymer layer;
- and
- increasing a cyclization in the polymer layer to above about 98% cyclization in the polymer layer, the increasing the cyclization comprising the additive acting as a catalyst;
- and
- after forming the polymer layer, forming a redistribution layer over the polymer layer, the redistribution layer being electrically coupled to the conductive feature.
A method of manufacturing a semiconductor device, the method comprising:
- depositing a polymer raw material over a substrate, the polymer raw material comprising:
- a polymer precursor;
- a cross-linker;
- and
- an additive;
- patterning the polymer raw material to form a polymer layer, the patterning the polymer raw material comprising exposing the polymer raw material to radiation, wherein after the exposing the polymer raw material to radiation the polymer layer has a first cyclization;
- and
- curing the polymer layer to form a cured polymer layer, wherein the additive acts as a catalyst for the curing the polymer layer, wherein the cured polymer layer has a second cyclization being greater than the first cyclization.
Dependencies are inferred from the claim text.