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US 12,649,164 B2Granted
Buffer chamber, substrate treating apparatus and substrate treating method
AssigneeSemes Co., Ltd.
InventorsJun Young Choi, Gui Su Park, Young Hun Lee, Young Jin Jang, Jun Hyun Lim
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Abstract
The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a batch-type treating bath for treating a substrate in a batch-type manner; a single-type treating chamber for treating the substrate in a single-type manner; and a buffer chamber positioned on a transfer path of the substrate transferred between the batch-type treating bath and the single-type treating chamber, and supplying a liquid for maintaining a wetting state of the substrate.
Claims12
A substrate treating apparatus comprising:
- a batch-type treating bath for treating a substrate in a batch-type manner;
- a single-type treating chamber for treating the substrate in a single-type manner;
- and
- a buffer chamber positioned at a transfer path of the substrate transferred between the batch-type treating bath and the single-type treating chamber, and configured to supply a liquid to the substrate for maintaining a wetting state of the substrate,
- wherein the buffer chamber includes:
- a chuck for supporting and rotating the substrate;
- and
- a liquid supply unit for supplying the liquid to the substrate supported and rotated on the chuck.
5 more elements
Dependencies are inferred from the claim text.