Continuous flow reactor for reacting an educt
AssigneeFraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.
InventorsAndreas Gabler, Wolfgang Schade, Thomas Gimpel, Patrick Preuster, Peter Wasserscheid
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Abstract
The invention relates to a continuous flow reactor having a wall which delimits a channel, wherein at least one sub-area is arranged in the channel that has microstructuring which includes individual structures, the diameter of which on a base is between about 10 μm to about 100 μm. The invention further relates to methods for reacting a gaseous or liquid educt under the action of a catalyst.
Claims16
A method for reacting a gaseous or liquid reactant under the influence of a catalyst, said method comprising:
- providing a flow reactor having at least one channel, said channel being delimited by a plurality of walls, wherein at least one sub-area of at least one of the plurality of walls has a microstructuring produced by short pulse laser radiation applied to the at least one sub-area, said short pulse laser radiation having a pulse duration of less than one nanosecond, said microstructuring comprising individual structures having a diameter on a base of about 10 μm to about 30 μm and an aspect ratio of about 1:3 to 3:1 calculated as a ratio of the structure's width to its height, wherein at least one catalyst is applied to the microstructuring, and
- supplying the reactant to the channel of the flow reactor, and
- allowing the reactant to undergo a chemical reaction inside the channel of the flow reactor.
A method for reacting a hydrogenated of liquid organic hydrogen carrier (LOHC) under the influence of a catalyst, said method comprising:
- providing a flow reactor wherein a first surface of a wall of said flow reactor is exposed to said LOHC;
- microstructuring at least one sub-area of the first surface of the wall of the flow reactor, said microstructuring comprising individual structures having a diameter on a base of about 10 μm to about 30 μm;
- applying a catalyst to the microstructuring of the at least one sub-area of the first surface of the wall;
- exposing the at least one sub-area of the first surface of the wall to said LOHC wherein the microstructuring and catalyst enhance the rate of a reaction.
Dependencies are inferred from the claim text.