Continuous plasma processing system with adjustable electrode

A continuous plasma processing system with adjustable electrode, comprising:

• a frame shape carrier plate configured to hold a to-be-processed object;
• a loading chamber configured to input the to-be-processed object;
• a processing chamber in communication with the loading chamber and configured to receive the to-be-processed object and carry out a plasma process on the to-be-processed object, the processing chamber comprising a first electrode, a second electrode, and a moving device, the first electrode and the second electrode disposed on two opposite ends in the processing chamber to form a processing space, the moving device connected with the second electrode;
• when the frame shape carrier plate moves to the processing space, the moving device controls the second electrode to move between an electrically disconnected position and an electrically conducted position;
• when the second electrode is away from the first electrode and does not contact the to-be-processed object, the second electrode is at the electrically disconnected position;
• when the second electrode moves toward the first electrode and passes through the frame shape carrier plate to push up the to-be-processed object to leave the frame shape carrier plate, the second electrode is at the electrically conducted position;
• and
• an unloading chamber in communication with the processing chamber and configured to receive and output the finished to-be-processed object.