High frequency RF generator and DC pulsing

A power supply comprising:

• a high voltage power supply;
• a nanosecond pulser electrically coupled with the high voltage power supply and switches voltage from the high voltage power supply at high frequencies;
• a transformer having a primary side and a secondary side, the nanosecond pulser electrically coupled with the primary side of the transformer;
• an output electrically coupled with the transformer producing a waveform, the waveform comprising:
• a plurality of high voltage pulses having a pulse amplitude, a pulse width, and a pulse repetition frequency;
• and
• a sinusoidal waveform having a waveform amplitude and a waveform frequency;
• a stray capacitance measured from the output having a capacitance less than about 20 nF;
• and
• a stray inductance measured from the output having an inductance less than about 400 nH.

A semiconductor plasma system comprising:

• a plasma chamber;
• and
• a high voltage power supply comprising:
• a high voltage power supply;
• a nanosecond pulser electrically coupled with the high voltage power supply that switches voltage from the high voltage power supply at high frequencies;
• a transformer having a primary side and a secondary side, the nanosecond pulser electrically coupled with the primary side of the transformer;
• and
• an output electrically coupled with the transformer and the plasma chamber, the output producing a waveform within the plasma chamber, the waveform comprising:
• a sinusoidal waveform configured to create a plasma within the plasma chamber, the sinusoidal waveform having a waveform frequency and a waveform amplitude greater than 100 V;
• and
• a plurality of high voltage pulses that accelerate plasma particles within the plasma chamber, the plurality of high voltage pulses having a pulse amplitude greater than about 2 kV, a pulse width, and a pulse repetition frequency.