Gas storage structure and gas storage device
AssigneeAura Material Inc.
InventorsChin-Chih Tai, Hsin Hung Pan, Fang Ching Chang
Life of this patent
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AssigneeAura Material Inc.
InventorsChin-Chih Tai, Hsin Hung Pan, Fang Ching Chang
Estimating the term…
A gas storage structure includes at least one tubular element. The at least one tubular element includes at least one channel and at least two gas storage layers. The at least two gas storage layers surround the at least one channel, wherein each of the at least two gas storage layers includes a plurality of pores, the at least two gas storage layers have different numbers of the plurality of pores per unit volume thereof, and sizes of the plurality of pores are different. Each of the at least two gas storage layers includes a plurality of crystallites, the plurality of pores are formed by the plurality of crystallites connected there among, and the plurality of pores are radially distributed from the at least one channel of the at least one tubular element to a peripheral area thereof.
A gas storage structure, comprising:
Dependencies are inferred from the claim text.