Connector system for use in ultra-high vacuum systems
AssigneeAtlas Bimetals Labs, Inc.
InventorJustin Chase Bothell
Life of this patent
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AssigneeAtlas Bimetals Labs, Inc.
InventorJustin Chase Bothell
Estimating the term…
A connector for use in an ultra-high vacuum system is disclosed herein. The connector has a metal conduit section with a first hardness, a metal fitting with a second hardness greater than the first hardness, and a metallic reaction-inhibiting barrier positioned between the conduit section and the fitting to sealingly attach the fitting to the conduit section. In some embodiments, application of a mechanical stressor such as stretching or treatment with a mechanical oxide disruptor removes oxide from and prevents oxide re-formation on the faying surface of the conduit section. In alternate embodiments, oxide is removed from the faying surface of the conduit section and oxide re-formation is subsequently prevented by applying an oxide inhibitor. The reaction-inhibiting barrier substantially inhibits metallic and chemical interaction between the conduit section and the fitting under ultra-high vacuum, temperature cycling, mechanical stress, and reactive chemical conditions, as are present during manufacturing.
A method of making a connector for use in an ultra-high vacuum system comprising the following steps in order:
A method of making a connector for use in an ultra-high vacuum system comprising the following steps in order:
A method of making a connector for use in an ultra-high vacuum system comprising the following steps in order:
Dependencies are inferred from the claim text.