Showerhead assembly with heated showerhead

A showerhead assembly for use in a process chamber, comprising:

• a heated showerhead having a heater plate and a gas distribution plate coupled to the heater plate;
• an ion filter spaced from the heated showerhead;
• a spacer ring between the heated showerhead and the ion filter, the spacer ring being thermally conductive and electrically insulative;
• a remote plasma region defined between the heated showerhead and the ion filter;
• a gap, on a radially inner side of the spacer ring, between the heated showerhead and the ion filter, the gap being in fluid communication with the remote plasma region;
• a first passage extending through the heater plate;
• and
• a second passage in communication with the first passage and extending through the gas distribution plate, the second passage extending to the gap,
• wherein the gas distribution plate includes a plurality of holes extending radially outwardly from the second passage, and wherein the ion filter includes another plurality of through holes below the second passage along a periphery of the ion filter.

A process chamber, comprising:

• a chamber body having an interior volume;
• a substrate support disposed in the interior volume;
• a showerhead assembly disposed in the interior volume opposite the substrate support, wherein the showerhead assembly comprises:
• a heated showerhead having a heater plate and a gas distribution plate coupled to the heater plate;
• an ion filter spaced from the heated showerhead;
• a spacer ring between the heated showerhead and the ion filter;
• a remote plasma region defined between the heated showerhead and the ion filter;
• a first gap, on a radially inner side of the spacer ring, between the gas distribution plate and the ion filter, the first gap being in fluid communication with the remote plasma region;
• a first passage extending through the heater plate;
• a second passage in communication with the first passage and extending through the gas distribution plate, the second passage extending to the first gap;
• a lower isolator supporting the ion filter spaced above the substrate support;
• and
• a pumping ring supporting the lower isolator,
• wherein the lower isolator is at least partly disposed between the ion filter and the pumping ring,
• wherein a second gap is defined between the lower isolator and the ion filter, and
• wherein the pumping ring has a fluid passageway in fluid communication with the second gap.