Apparatus for collecting reaction by-products for semiconductor processes through pyrolysis in the high temperature region and oxidation reaction in the low temperature region

An apparatus for collecting reaction by-products for semiconductor processes through pyrolysis in a high-temperature region and an oxidation reaction in a low-temperature region, the apparatus being configured to collect the reaction by-products by accommodating exhaust gas, which is discharged from a process chamber, in a housing (1) while heating the exhaust gas with a heater part (2), and the apparatus comprising:

• a first dispersion-collection part (3) configured to collect reaction by-products while dispersing exhaust gas, which contains a High K material that is introduced into a gas inlet port (121) of the housing (1) and thermally decomposed by a heater part (2), to a lower box-shaped collection part;
• the box-shaped collection part (4) including a collection box (41) configured to accumulate collected powdered oxides while accommodating the introduced exhaust gas in an internal space, in which the low-temperature region is formed, and then discharging the exhaust gas, and a collection plate part (42) installed in the collection box (41) and having a plurality of collection plates (421) spaced apart from one another in an upward/downward direction and provided in a multi-stage manner to grow a solid-phase High K material to the powdered oxide through the oxidation reaction in the low-temperature region and collect the powdered oxide;
• a cooling pad part (5) configured to circulate a coolant, which is supplied from the outside, and discharge the coolant to maximize an area of the low-temperature region and provide the low-temperature region to the box-shaped collection part (4);
• and
• a second dispersion-collection part (6) configured to collect the reaction by-products while dispersing downward the exhaust gas have passed through the box-shaped collection part (4).