Ethoxy/propoxy modified pyrazoline organic matter, application thereof, photocurable composition, and photoresist

Abstract

An ethoxy/propoxy modified pyrazoline organic matter, an application thereof, a photocurable composition, and a photoresist. The introduction of —CH2—CH2—O(EO) and/or —CH(CH3)—CH2—O(PO) enables an EO/PO modified pyrazoline organic matter to have excellent compatibility with other components in a photocuring system, and the organic matter is solid, and is easy to add and use. In addition, the ethoxy/propoxy modified pyrazoline organic matter has an absorption band of 360-400 nm, and is thus particularly suitable for use as a sensitizer in the photocuring system (such as a system containing a bisimidazole photoinitiator), thereby greatly improving the sensitivity of the photocuring system. On this basis, the EO/PO modified pyrazoline organic matter has high sensitivity enhancement, features low usage, is solid, and is easy to add and use.

Dependencies are inferred from the claim text.