Substrate processing apparatus, substrate processing method, and article manufacturing method

A substrate processing apparatus configured to perform pattern formation processing on a composition on a substrate, the substrate processing apparatus comprising:

• a radiation unit configured to radiate light onto the substrate;
• a dispenser configured to apply the composition to a position inside the substrate processing apparatus;
• a template holding unit configured to hold a template to be brought in contact with the composition on the substrate;
• and
• a controller configured to:
• control a radiation amount of the light to be radiated by the radiation unit based on spectral sensitivity characteristics, which are measured by a spectrometer, of the composition applied to the position by the dispenser;
• and
• measure wavelength characteristics of the light of the radiation unit.

A substrate processing apparatus configured to perform pattern formation processing on a composition on a substrate, the substrate processing apparatus comprising:

• a radiation unit configured to radiate light onto the substrate;
• a dispenser configured to apply the composition to a position inside the substrate processing apparatus;
• a template holding unit configured to hold a template to be brought in contact with the composition on the substrate;
• and
• a controller configured to control:
• a radiation amount of the light to be radiated by the radiation unit based on spectral sensitivity characteristics, which are measured by a spectrometer, of the composition applied to the position by the dispenser;
• and
• at least one of a light illuminance intensity of the light of the radiation unit or a radiation time in which the light is radiated to the composition.

An article manufacturing method that is performed using a substrate processing apparatus including a radiation unit configured to radiate light onto a substrate, a dispenser configured to apply the composition to a position inside the substrate processing apparatus, a template holding unit configured to hold a template to be brought in contact with the composition on the substrate, and a controller configured to control a radiation amount of the light to be radiated by the radiation unit based on spectral sensitivity characteristics, which are measured by a spectrometer, of the composition applied to the position by the dispenser, and wherein the dispenser applies the composition to the position, which is on a measurement plate disposed on a substrate stage configured to move while holding the substrate, the article manufacturing method comprising:

• a pattern formation step of forming a pattern on the substrate;
• a processing step of processing the substrate on which the pattern has been formed in the pattern formation step;
• and
• a step of manufacturing an article from the substrate processed in the processing step.