Back to results
US 12,643,123 B2Granted
Slurry supply device and slurry supply method
AssigneeLG Energy Solution, Ltd.
InventorsHyung-Woo Choi, Sung-Mo Kang, Sang-Min Kim, Kyoung-Rok Mun, Jong-Goo Park, Jong-Woo Shin, Do-Young Ahn, Jae-Pil Lee, Shin-Wook Jeon, Sang-Hoon Choy
Life of this patent
Estimating the term…
Abstract
A slurry supply device includes a slurry tank for storing slurry; a temperature controller for supplying hot or cold water to the slurry tank to control the temperature of the slurry; and a double pipe for supplying the slurry to the slurry tank while being connected to the slurry tank and for allowing hot or cold water to move to control the temperature of the slurry.
Claims10
A slurry supply device comprising:
- a slurry tank configured to supply a slurry to a slot die coater;
- a temperature controller configured to supply hot or cold water to the slurry tank to control a temperature of the slurry stored in the slurry tank;
- and
- a double pipe communicating with the slurry tank and configured to supply the slurry to the slurry tank and also configured to convey the hot or cold water to control the temperature of the slurry.
1 more element
A method of supplying slurry, the method comprising:
- supplying hot or cold water to a slurry tank from a temperature controller to control a temperature of slurry, wherein the slurry tank is configured to supply the slurry to a slot die coater;
- moving the hot or cold water from the slurry tank to a double pipe connected to supply the slurry to the slurry tank;
- and
- conveying the hot or cold water from the double pipe into the temperature controller.
1 more element
Dependencies are inferred from the claim text.