Purification processing apparatus, substrate processing system, and processing method

A substrate processing system comprising:

• a substrate processing apparatus including a spin chuck configured to hold and rotate a wafer;
• and
• a purification processing apparatus for supplying purified isopropyl alcohol to the substrate processing apparatus, comprising:
• a processing chamber in which unpurified isopropyl alcohol and ionic liquid are mixed, and the isopropyl alcohol and the ionic liquid are separated to purify the isopropyl alcohol,
• an unpurified solvent supply port configured to supply the unpurified isopropyl alcohol to the processing chamber,
• an ionic liquid supply port configured to supply the ionic liquid to the processing chamber,
• a purified solvent outlet connected to the substrate processing apparatus and configured to supply the purified isopropyl alcohol from the processing chamber to the substrate processing apparatus, and
• a waste liquid outlet configured to discharge the ionic liquid from the processing chamber,
• wherein the purified solvent outlet connected to the substrate processing apparatus is provided at an upper side relative to the waste liquid outlet in the processing chamber.