Substrate processing apparatus and substrate processing apparatus control method
AssigneeSCREEN Holdings Co., Ltd.
InventorTetsuya Shibata
Life of this patent
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Abstract
A substrate processing method includes: a first step of causing, in a state of a substrate holding mechanism not holding a plurality of substrates, a camera to capture an image of the substrate holding mechanism and an image of an interior to generate first image data; a second step of identifying, in a first region indicated by the first image data, a second region being a region in which at least the image of the substrate holding mechanism has been captured; and a third step of comparing a gradient of the first image data distributed in a third region being a region in the first region other than the second region with a threshold for the gradient.
Claims20
A substrate processing apparatus control method for controlling a substrate processing apparatus, wherein
- the substrate processing apparatus comprises:
- a processing tank to store a processing liquid into which a plurality of substrates are dipped to collectively process the plurality of substrates;
- a holder having a function of collectively holding the plurality of substrates;
- an elevator being a mechanism having a function of dipping the holder into the processing liquid and a function of removing the holder from the processing liquid;
- and
- a camera to capture an image of an interior of the processing tank and an image of the holder from a side of the holder opposite the processing tank to generate image data, and
- the substrate processing apparatus control method comprises:
- a) causing, in a state of the holder not holding the plurality of substrates, the camera to capture the image of the holder and the image of the interior to generate first image data;
- b) identifying, in a first region indicated by the first image data, a second region being a region in which at least the image of the holder has been captured;
- and
- c) comparing a gradient of the first image data distributed in a third region with a threshold for the gradient, the third region being a region in the first region other than the second region.
A substrate processing apparatus comprising:
- a processing tank to store a processing liquid into which a plurality of substrates are dipped to collectively process the plurality of substrates;
- a holder having a function of collectively holding the plurality of substrates;
- an elevator being a mechanism having a function of dipping the holder into the processing liquid and a function of removing the holder from the processing liquid;
- a camera to capture an image of an interior of the processing tank and an image of the holder from a side of the holder opposite the processing tank to generate image data;
- and
- a controller, wherein
- the controller
- causes, in a state of the holder not holding the plurality of substrates, the camera to capture the image of the holder and the image of the interior to generate first image data;
- identifies, in a first region indicated by the first image data, a second region being a region in which the image of the holder has been captured;
- and
- compares a gradient of the first image data in a third region with a threshold for the gradient, the third region being obtained by excluding the second region from the first region.
Dependencies are inferred from the claim text.