Frequency and power modulation radio frequency (RF) generator

A frequency and power modulation radio frequency (RF) generator comprising:

• a controller configured to generate a control signal;
• a signal generator configured to generate an RF signal according to the control signal of the controller;
• an amplifier configured to amplify power of the RF signal generated by the signal generator according to a gain information of the control signal of the controller;
• a phase controlled power correction (PCPC) circuit configured to control a phase of the RF signal amplified by the amplifier;
• and
• a sensor arranged between the amplifier and the PCPC circuit and configured to detect a phase difference between a voltage of the RF signal and a current thereof,
• wherein the controller is configured to cause the signal generator, the amplifier, and the PCPC circuit to perform multi-level pulsing and frequency modulation on the RF signal.

Plasma equipment comprising:

• a chamber;
• and
• a first frequency and power modulation radio frequency (RF) generator connected to the chamber,
• wherein the first frequency and power modulation RF generator comprises:
• a controller configured to generate a control signal;
• a signal generator configured to generate an RF signal according to the control signal of the controller;
• an amplifier configured to amplify power of the RF signal generated by the signal generator according to a gain information of the control signal of the controller;
• a phase controlled power correction (PCPC) circuit comprising a capacitor, an inductor, and a switch and configured to control a voltage and a current of the RF signal, which is amplified by the amplifier, to have a same phase;
• and
• a sensor arranged between the amplifier and the PCPC circuit and configured to detect a phase difference between the voltage and the current, and
• wherein the controller is configured to cause the signal generator, the amplifier, and the PCPC circuit to perform multi-level pulsing and frequency modulation on the RF signal, thereby supplying RF power of the RF signal to the chamber.