Evaluation apparatus, evaluation method, and evaluation program

An evaluation method comprising:

• reading, from a storage, a simulation parameter of a topography simulator and first range information and second range information that are associated with each other, the simulation parameter of the topography simulator being calculated so that the topography simulator outputs, in response to topography information of an unprocessed substrate being input to the topography simulator, topography information similar to topography information of a processed substrate that is to be obtained by processing the unprocessed substrate under a predetermined processing condition of the substrate processing apparatus, the first range information indicating a topography range that is deemed to be the same as a topography of the unprocessed substrate, and the second range information indicating a topography range that is deemed to be the same as a topography of the processed substrate;
• providing topography information of a new unprocessed substrate and the simulation parameter to the topography simulator to cause the topography simulator to output predict topography information of a new processed substrate that is to be obtained by processing the new unprocessed substrate under the predetermined processing condition;
• outputting a result of comparing the topography information of the new unprocessed substrate with the first range information and a result of comparing the topography information of the new processed substrate with the second range information;
• and
• determining, based on the comparison result, whether the simulation parameter to the topography simulator is appropriate for use in substrate processing.

A non-transitory computer-readable recording medium storing a program including instructions that when executed by a processor of an evaluation apparatus cause the processor to perform operations comprising:

• reading, from a storage, a simulation parameter of a topography simulator and first range information and second range information that are associated with each other, the simulation parameter of the topography simulator being calculated so that the topography simulator outputs, in response to topography information of an unprocessed substrate being input to the topography simulator, topography information similar to topography information of a processed substrate that is to be obtained by processing the unprocessed substrate under a predetermined processing condition of the substrate processing apparatus, the first range information indicating a topography range that is deemed to be the same as a topography of the unprocessed substrate, and the second range information indicating a topography range that is deemed to be the same as a topography of the processed substrate;
• providing topography information of a new unprocessed substrate and the simulation parameter to the topography simulator to cause the topography simulator to output predict topography information of a new processed substrate that is to be obtained by processing the new unprocessed substrate under the predetermined processing condition;
• outputting a result of comparing the topography information of the new unprocessed substrate with the first range information and a result of comparing the topography information of the new processed substrate with the second range information;
• and
• determining, based on the comparison result, whether the simulation parameter to the topography simulator is appropriate for use in substrate processing.