AI system for wafer defect detection
AssigneeAPPLE T Co., Ltd.
InventorHan Chul Lee
Life of this patent
Estimating the term…
Abstract
An artificial intelligence (AI) system for wafer defect detection may include a CIS device configured to mount to track equipment and to transmit a scanned image of a wafer to a database; and a server configured to learn the scanned image, to distinguish a defect of the wafer for each defect category, to learn defects that occur in exposure equipment and the track equipment for each type, and to perform real-time monitoring. The server is configured to change a periodic sampling inspection to a total inspection method through the CIS device in response to occurrence of the defect in the wafer.
Claims10
An artificial intelligence (AI) system for wafer defect detection, the AI system comprising:
- a CIS (Contact Image Sensor) device configured to mount to track equipment and to transmit a scanned image of a wafer to a database;
- and
- a server configured to learn the scanned image, to distinguish a defect of the wafer for each defect category, to learn defects that occur in exposure equipment and the track equipment for each type, and to perform real-time monitoring,
- wherein the server is configured to change a periodic sampling inspection to a total inspection method through the CIS device in response to occurrence of the defect in the wafer.
Dependencies are inferred from the claim text.