US 12,638,605 B2 · Plasma light detection system including a scintillating window

Abstract

A substrate processing apparatus includes a process chamber providing a process space, a stage located in the process chamber and configured to support a substrate, a window coupled to a side of the process chamber, and a scintillator layer coupled to one side surface of the window. The scintillator layer covers a portion of the one side surface of the window which is less than the full window surface. A second surface corresponding to another portion of the one side surface of the window is exposed. Light emitted by a plasma in the process space passes through the window and is collected by an optical system and analyzed. Ultraviolet light passing through the scintillator is converted to longer wavelength, generally visible, light. Comparing the light passing through the bare window with the light passing through the scintillator layer enables analysis of the plasma.

Claims20

Dependent claims

A substrate processing system comprising:

a substrate processing apparatus,
wherein the substrate processing apparatus comprises:
a process chamber providing a process space;
a stage located in the process chamber and configured to support a substrate;
a window coupled to a side of the process chamber and having a first surface and a second surface opposite the first surface;
and
a scintillator layer coupled to the first surface of the window,
wherein a portion of the first surface of the window is covered by the scintillator layer, and an area of the portion is less than an area of the first surface of the window.

5 more elements

Dependencies are inferred from the claim text.

Plasma light detection system including a scintillating window

Life of this patent

Plasma light detection system including a scintillating window

Life of this patent

Abstract

Claims20