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US 12,637,770 B2Granted
Deposition device and deposition method
AssigneeMagnolia White Corporation
InventorsTakanobu Takenaka, Atsushi Takeda
Life of this patent
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Abstract
According to one embodiment, a deposition device includes a stage, a deposition head opposed to the stage, and a chamber accommodating the stage and the deposition head. The deposition head comprises a deposition source heating a material and generating vapor, a nozzle connected to the deposition source to emit the vapor generated by the deposition source, a control plate comprising a sleeve surrounding the nozzle, and a movement mechanism moving the control plate along an extension direction of the sleeve.
Claims5
A deposition device comprising:
- a first deposition head configured to deposit a first material on a processing substrate;
- and
- a second deposition head configured to deposit a second material on the processing substrate on which the first material is deposited,
- each of the first deposition head and the second deposition head comprising:
- a deposition source heating the material and generating vapor;
- a nozzle connected to the deposition source to emit the vapor generated by the deposition source;
- and
- a sleeve surrounding the nozzle and further extending to the processing substrate than a tip of the nozzle,
- a distance from the tip of the nozzle to a tip of the sleeve in the second deposition head being smaller than a distance from the tip of the nozzle to a tip of the sleeve in the first deposition head.
6 more elements
Dependencies are inferred from the claim text.