Method of densifying plasma-resistant coating layer

A method of densifying a plasma-resistant coating layer, the method comprising:

• forming a fluorocarbon deposition layer that covers a surface of a base material comprising an yttrium oxide coating;
• irradiating the fluorocarbon deposition layer with a laser beam to destroy a fluorocarbon structure included in the fluorocarbon deposition layer;
• and
• forming a YOF coating layer on the surface of the base material from fluorine (F) generated from the destroyed fluorocarbon structure.

A method of densifying a plasma-resistant coating layer, the method comprising:

• forming a fluorocarbon deposition layer that has a thickness of 1 nm or greater and entirely covers a surface of a base material, the surface of the base material comprising an yttrium oxide coating;
• irradiating the fluorocarbon deposition layer with a pulsed laser beam having an instantaneous temperature of 500° C. to 2,000° C.;
• and
• forming a YOF coating layer on the surface of the base material by fluorine material included in the fluorocarbon deposition layer reacting with an yttrium oxide material included in the surface of the base material while removing a carbon material included in the fluorocarbon deposition layer through an exhaust system,
• wherein the YOF coating layer entirely covers the surface of the base material, and
• wherein an average misorientation angle between sub-grains in a surface of the yttrium oxide material, which is included in the surface of the base material before and after the irradiating of the fluorocarbon deposition layer with the pulsed laser beam, is increased after the irradiating of the fluorocarbon deposition layer with the pulsed laser beam than before irradiating the fluorocarbon deposition layer.