Treatment solution and treatment method
AssigneesKabushiki Kaisha Toshiba, Tohoku University
InventorsKenya Uchida, Hiroyuki Fukui, Ikuo Uematsu, Takeaki Iwamoto, Eunsang Kwon
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Abstract
According to one embodiment, a treatment solution is provided. The treatment solution is used for treating halosilanes having a cyclic structure. The treatment solution includes at least one of an inorganic base or an organic base and being basic.
Claims13
A method for treating a cyclic halosilane comprising:
- contacting the cyclic halosilane with a basic treatment solution comprising at least one of an inorganic base or an organic base to obtain a mixture of the cyclic halosilane and the basic treatment solution wherein the cyclic structure of the cyclic halosilane comprises Si, and
- the cyclic halosilane is a solid material or liquid.
A method for treating a byproduct comprising a cyclic halosilane, comprising:
- contacting the cyclic halosilane with water to obtain a mixture of water and the cyclic halosilane;
- and
- contacting the mixture of the cyclic halosilane and water with a basic treatment solution comprising at least one of an inorganic base or an organic base,
- wherein the cyclic structure of the cyclic halosilane comprises Si, and
- the cyclic halosilane is a solid material or a liquid.
A method for treating a byproduct obtained from a process of synthesizing a silicon-containing material using a gas which comprises silicon and halogen, the byproduct comprising cyclic halosilanes, the treating method comprising:
- contacting the byproduct with a basic treatment solution under an inert atmosphere,
- wherein the cyclic structure of the cyclic halosilanes comprises Si, and
- the cyclic halosilane is a solid material or a liquid.
Dependencies are inferred from the claim text.