Surface treatment composition, method for producing surface treatment composition, surface treatment method, and method for producing semiconductor substrate
AssigneeFujimi Incorporated
InventorsTsutomu Yoshino, Shogo Onishi, Yasuto Ishida
Life of this patent
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Abstract
To provide a means capable of sufficiently removing organic residues present on the surface of a polishing object after polishing containing silicon oxide or polysilicon. A surface treatment composition contains a polymer having a constituent unit represented by Formula (1) below and water and is used for treating the surface of a polishing object after polishing, in which, in Formula (1) above, R1 is a hydrocarbon group having 1 to 5 carbon atoms and R2 is a hydrogen atom or a hydrocarbon group having 1 to 3 carbon atoms.
Claims15
A surface treatment composition comprising:
- a polymer having a constituent unit represented by Formula (1) below;
- water;
- and
- a water-soluble polymer having a constituent unit derived from glycerol, wherein a content of the water-soluble polymer is 0.03 mass % or more and 0.5 mass % or less based on a total amount of the surface treatment composition,
- the surface treatment composition being used for treating a surface of a polishing object after polishing,
- wherein, in Formula (1) above, R1 is a hydrocarbon group having 1 to 5 carbon atoms and R2 is a hydrogen atom or a hydrocarbon group having 1 to 3 carbon atoms;
- and
- wherein the surface treatment composition is substantially free from an abrasive.
A method for producing a surface treatment composition, the method comprising:
- mixing a polymer having a constituent unit represented by Formula (1) below, water, and a water-soluble polymer having a constituent unit derived from glycerol, wherein a content of the water-soluble polymer is 0.03 mass % or more and 0.5 mass % or less based on a total amount of the surface treatment composition,
- wherein, in Formula (1), R1 is a hydrocarbon group having 1 to 5 carbon atoms and R2 is a hydrogen atom or a hydrocarbon group having 1 to 3 carbon atoms;
- and
- wherein the surface treatment composition is substantially free from an abrasive.
Dependencies are inferred from the claim text.