Substrate processing apparatus
AssigneeJusung Engineering Co., Ltd.
InventorsIn Woo Back, Jong Chul Kim, Yeong Seop Byeon, In Cheol Yeo, Chul Joo Hwang
Life of this patent
Estimating the term…
Abstract
The present inventive concept relates to a substrate processing apparatus comprising: a chamber providing a processing space; a lid for covering the top of the chamber; a substrate support part supporting at least one substrate and rotating about a rotation axis such that the substrate passes through an imaging area; a gas injection part for injecting a process gas toward the substrate support part; an area image capturing part for capturing an image of the imaging area to obtain a thermal image of the imaging area; and a calculation part for calculating the temperature data of the substrate from the thermal image.
Claims14
An apparatus for processing substrate, the apparatus comprising:
- a chamber providing a processing space;
- a lid covering an upper portion of the chamber;
- a substrate supporting unit supporting at least one substrate and rotating about a rotational shaft so that a substrate passes through a photographing region;
- a gas injection unit injecting a processing gas toward the substrate supporting unit;
- a region photographing unit photographing the photographing region to obtain a thermal image of the photographing region;
- and
- a calculation unit calculating temperature data of a substrate from the thermal image, wherein the calculation unit comprises:
- an extraction module extracting first candidate data of a point-based temperature of a substrate corresponding to a first measurement line from the thermal image and extracting second candidate data of a point-based temperature of a substrate, corresponding to a second measurement line parallel to the first measurement line, from the thermal image, both the first candidate data and the second candidate data being extracted from the thermal image obtained at a certain moment;
- and
- a calculation module calculating temperature data of a point-based temperature of a substrate included in the thermal image by using the first candidate data and the second candidate data,
- wherein the first candidate data includes a first temperature corresponding to a first point on the first measurement line and the second candidate data includes a second temperature corresponding to a second point which is a point on the second measurement line corresponding to the first point, and
- wherein the calculation module is configured to (i) determine an average temperature of the first and second temperatures as a point-based temperature corresponding to the first and second points if both the first and second temperatures are equal to or lower than a predetermined reference temperature, (ii) determine the second temperature as the point-based temperature corresponding to the first and second points if only the first temperature among the first and second temperatures is higher than the predetermined reference temperature, and (iii) transmit an alarm if both the first and second temperatures are higher than the predetermined reference temperature.
Dependencies are inferred from the claim text.