Manufacturing method for electrochemical element and electrochemical element
AssigneeOsaka Gas Co., Ltd.
InventorsMitsuaki Echigo, Hisao Ohnishi, Yuji Tsuda, Kyohei Manabe, Kazuyuki Minami
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Abstract
Provided is a low-cost electrochemical element that has excellent performance, reliability, and durability. Also, provided is a manufacturing method for an electrochemical element including a metal substrate (metal support) and an electrode layer formed on/over the metal substrate. The method includes an electrode layer forming step of forming an electrode layer having a region with a surface roughness of 1.0 μm or less on/over the metal substrate, and an electrolyte layer forming step of forming an electrolyte layer by spraying aerosolized metal oxide powder onto the electrode layer.
Claims1
A manufacturing method for an electrochemical element including a metal support, an electrode layer formed on/over the metal support, and an intermediate layer formed on/over the electrode layer, the method comprising:
- an intermediate layer forming step of forming the intermediate layer having a region with a surface roughness (Ra) of 0.224 μm or less on the electrode layer;
- and
- an electrolyte layer forming step of forming an electrolyte layer having a density of 90% or more by spraying aerosolized metal oxide powder onto the intermediate layer,
- wherein the intermediate layer forming step includes smoothing a region of the intermediate layer and heating the intermediate layer at a temperature of 1050° C. or lower,
- wherein the electrode layer is at least partially disposed between the metal support and the electrolyte layer,
- wherein the metal support has at least one through hole inside a region in which the electrolyte layer is formed, and
- wherein the metal support has a thickness of 0.1 mm to 0.5 mm,
- the electrode layer has a thickness of 5 μm to 50 μm,
- the intermediate layer has a thickness of 2 μm to 50 μm,
- the metal support is ferrite-based stainless steel,
- the intermediate layer is GDC or YDC, and
- a metal oxide thin layer is provided on/over a surface of the metal substrate, and
- said metal oxide thin layer is provided also on a surface that is in contact with the electrode layer and an inner surface of the through hole.
Dependencies are inferred from the claim text.