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US 12,631,563 B2Granted
Methods for creating large-area complex nanopatterns for nanoimprint molds
AssigneeThe Trustees of Princeton University
InventorsStephen Y. Chou, Fei Ding
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Abstract
Some embodiments of the invention provide methods that can create large area complex patterns for nanoimprint molds without or with very litter of the use of the charged beam or photon beam direct-writing of nanostructures. Some embodiments of the invention use (i) Fourier nanoimprint patterning (FNP), (ii) edge-guided nanopatterning (EGN), and (iii) nanostructure self-perfection, and their combinations.
Claims1
A method for creating a nanoimprint mold of a nanopattern, comprising:
- (a) providing a nanoimprint mold substrate with a surface made of silicon, wherein three-dimensional nanopatterns are created in the silicon surface;
- (b) oxidizing the sidewalls of the silicon nanopatterns to form silicon dioxide on the sidewall;
- and
- (c) removing a portion of the remaining silicon inside of the silicon dioxide sidewall, while leaving a portion of silicon dioxide sidewalls on the nanoimprint mold;
- wherein the remaining portions of the silicon dioxide sidewalls become the structures for sequential nanoimprint, and wherein the three dimensional nanopatterns are pillars and the part of the silicon dioxide sidewall is a ring.
2 more elements
Dependencies are inferred from the claim text.