Shield body system for a process fluid for chemical and/or electrolytic surface treatment of a substrate

A shield body system for a process fluid for chemical and/or electrolytic surface treatment of a substrate, the shield body system comprising:

• a substrate holder, a shield body, and an agitation unit,
• wherein the substrate holder is configured to hold the substrate during surface treatment,
• wherein the shield body defines a plurality of openings to direct a process fluid flow and/or a current density distribution towards the substrate to be treated held by the substrate holder,
• wherein the agitation unit is configured to move the shield body and substrate held by the substrate holder together vertically and horizontally relative to a distribution body for chemical and/or electrolytic surface treatment, and
• the shield body system further comprising the distribution body defining a plurality of openings through which the process fluid flow and/or the current density distribution can be directed towards the shield body,
• wherein the shield body is configured to be arranged between the substrate held by the substrate holder and the distribution body,
• wherein the shield body is arranged next to the distribution body within a distance of 50 μm to 12 mm.