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US 12,630,935 B2Granted
Electrolytic cell equipped with microelectrodes
AssigneeIndustrie De Nora S.P.A.
InventorAndrea Francesco Gulla
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Abstract
An electrolytic cell equipped with microelectrodes for the generation of un-separated products and the method for obtaining it. The cell and the microelectrodes are obtained using a technology for the production of microelectromechanical systems (MEMS). The anodic and cathodic microelectrodes have an electrocatalytic coating and are mutually intercalated at an interelectrodic gap lower than 300 micrometres.
Claims6
A method for manufacturing an electrolytic cell comprising:
- providing a lithographically-patterned substrate consisting of an interdigitated surface by a lithographic technique;
- applying an external electrode layer by microwave-assisted chemical vapour deposition upon said interdigitated surface to form anodic and cathodic microelectrodes surrounding each digit of said interdigitated surface, said anodic and cathodic microelectrodes being mutually intercalated at an inter-anodic-cathodic gap lower than 100 micrometres and having an average surface roughness Ra lower than 0.05 μm;
- wherein said substrate is topped with a SiO2 layer and said external electrode layer comprises a boron-doped diamond.
A method for manufacturing an electrolytic cell comprising:
- providing a lithographically-patterned substrate consisting of an interdigitated surface by a lithographic technique;
- applying an external electrode layer by vapour phase physical or chemical deposition technique upon said interdigitated surface to form anodic and cathodic microelectrodes surrounding each digit of said interdigitated surface, said anodic and cathodic microelectrodes being mutually intercalated at an inter-anodic-cathodic gap lower than 100 micrometres and having an average surface roughness Ra lower than 0.05 μm,
- wherein said substrate is topped with a SiO2 layer and said external electrode layer comprises a material containing at least one element selected from the group consisting of Pt, Pd, Ir, Ru, Rh, Nb and Ti.
A method for manufacturing of an electrolytic cell comprising:
- providing a substrate provided with a SiO2 top layer;
- applying a boron-doped diamond film by growing directly on the SiO2 top layer of the substrate using chemical deposition technique and laser etching;
- applying a laser technique to obtain a multiplicity of finger shaped anodic and cathodic microelectrodes being mutually intercalated at an inter-anodic-cathodic gap lower than 100 micrometres and having an average surface roughness Ra lower than 0.05 μm.
Dependencies are inferred from the claim text.