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US 12,630,923 B2Granted
Flow velocity increasing device and apparatus for depositing thin film including the same
AssigneeSemes Co., Ltd.
InventorsSun Il Kim, Sung Nam Yoo, Jin Il Sung
Life of this patent
Estimating the term…
Abstract
A flow velocity increasing device of an apparatus for depositing a thin film includes a device body disposed within the chamber and a flow velocity increasing hole portion formed in the device body and tapered in a direction of gas passage so that a flow velocity of passed gas is faster than that externally.
Claims10
An apparatus for depositing a thin film, the apparatus comprising:
- a chamber having a gas injection portion including a source gas nozzle, a reactant gas nozzle, and a purge gas nozzle, and a gas discharge port;
- a vacuum pump connected to the chamber;
- and
- a flow velocity increasing device disposed within the chamber,
- wherein the flow velocity increasing device includes:
- a device body disposed within the chamber;
- a flow velocity increasing hole portion formed in the device body and tapered in a direction of gas passage and configured to cause a flow velocity of passed gas to be faster than that externally to increase a circulating power of the passed gas to enhance uniform thin film deposition in at least one of enclosed regions or stepped surfaces of an object;
- a holder disposed in the chamber and configured to hold an object to be deposited;
- an object rotating unit connected to the holder and configured to rotate the holder so that the object to be deposited rotates;
- and
- an object revolving unit connected to the holder and configured to revolve the holder so that the object to be deposited revolves.
8 more elements
An apparatus for depositing a thin film, the apparatus comprising:
- a source gas supply tank supplying a source gas;
- a reactant gas supply tank supplying a reactant gas;
- a purge gas supply tank supplying purge gas;
- a chamber having a gas injection portion including a source gas nozzle connected to the source gas supply tank, a reactant gas nozzle connected to the reactant gas supply tank, and a purge gas nozzle connected to the purge gas supply tank, and a gas discharge port;
- a vacuum pump connected to the chamber;
- a flow velocity increasing device disposed within the chamber,
- wherein the flow velocity increasing device includes:
- a device body disposed within the chamber;
- and
- a flow velocity increasing hole portion formed in the device body and tapered in a direction of gas passage and configured to cause a flow velocity of passed gas to be faster than that externally to increase a circulating power of the passed gas to enhance uniform thin film deposition in at least one of enclosed regions or stepped surfaces of an object;
- a holder disposed in the chamber and configured to hold an object to be deposited;
- an object rotating unit connected to the holder and configured to rotate the holder so that the object to be deposited rotates;
- and
- an object revolving unit connected to the holder and configured to revolve the holder so that the object to be deposited revolves.
11 more elements
Dependencies are inferred from the claim text.