Radiation sensitive organotin compositions having oxygen heteroatoms in hydrocarbyl ligand
AssigneeInpria Corporation
InventorsRobert E. Jilek, Brian J. Cardineau, Lucy Su Xiao Huffman, Stephen T. Meyers
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AssigneeInpria Corporation
InventorsRobert E. Jilek, Brian J. Cardineau, Lucy Su Xiao Huffman, Stephen T. Meyers
Estimating the term…
Organotin compositions having the formula RSnL3 and corresponding synthetic methods are described. R includes aromatic, cyclic and/or halogenated ether moieties, or polyethers, and L includes hydrolysable groups. The organotin compositions may be formed as radiation-patternable coatings on substrates. The coatings may have an average thickness from about 1 nm to about 75 nm and have the formula RSnOn(OH)3-2n, forming an oxo-hydroxo network, where R is a hydrocarbyl ether group with 1 to 30 carbon atoms and 0<n<3/2, wherein regions of the coating are soluble in 2-heptanone in a puddle development step following a bake at 150° C. for 120 seconds. The coatings may be radiation-patternable using UV, EUV or ion beam radiation, and corresponding methods are described.
An organotin composition represented by the formula RSnL3, where L is a hydrolysable ligand and R— is A) an aromatic ether represented by the formula Ar—O—(CR′2)m—, or B) R is a cyclic ether represented by the formula cyclic(O(CR″2)nCR′R0—), or C) R is a halogenated ether represented by the formula R1OR0C(R2R3)—, or D) R is a polyether represented by the formula R1R2R3C—, where Ar is an aromatic organic moiety;
A radiation-patternable coated substrate comprising a substrate and a coating having an average thickness from about 1 nm to about 75 nm and represented by the formula RSnOn(OH)3-2n, forming an oxo-hydroxo network, where R is a hydrocarbyl ether group with 1 to 30 carbon atoms and 0<n<3/2, wherein regions of the coating are soluble in 2-heptanone in a puddle development step following a bake at 150° C. for 120 seconds.
Dependencies are inferred from the claim text.