Organometallic adduct compound and method of manufacturing integrated circuit device by using the same
AssigneesSamsung Electronics Co., Ltd., Adeka Corporation
InventorsSeungmin Ryu, Younsoo Kim, Jaewoon Kim, Kazuki Harano, Kazuya Saito, Takanori Koide, Yutaro Aoki, Gyuhee Park, Younjoung Cho, Wakana Fuse, Yoshiki Manabe, Hiroyuki Uchiuzou, Masayuki Kimura, Takahiro Yoshii
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Abstract
An organometallic adduct compound and a method of manufacturing an integrated circuit device, the organometallic adduct compound being represented by General Formula (I):
Claims16
An organometallic adduct compound represented by General Formula (I):
- wherein, in General Formula (I),
- R1, R2, R3, R4, and R5 are each independently
- a hydrogen atom,
- a halogen atom,
- a substituted or unsubstituted C1 to C5 linear alkyl group,
- a substituted or unsubstituted C3 to C5 branched alkyl group,
- a substituted or unsubstituted C2 to C5 linear alkenyl group, or
- a substituted or unsubstituted C3 to C5 branched alkenyl group,
- at least one of R1, R2, R3, R4, and R5 is
- a fluorine atom,
- a fluorine atom-substituted C1 to C5 linear alkyl group,
- a fluorine atom-substituted C3 to C5 branched alkyl group,
- a fluorine atom-substituted C2 to C5 linear alkenyl group, or
- a fluorine atom-substituted C3 to C5 branched alkenyl group
- X is a halogen atom, and
- M is a niobium atom or a tantalum atom.
A method of manufacturing an integrated circuit device, the method comprising forming a metal-containing film on a substrate by using an organometallic adduct compound represented by General Formula (I):
- wherein, in General Formula (I),
- R1, R2, R3, R4, and R5 are each independently
- a hydrogen atom,
- a halogen atom,
- a substituted or unsubstituted C1 to C5 linear alkyl group,
- a substituted or unsubstituted C3 to C5 branched alkyl group,
- a substituted or unsubstituted C2 to C5 linear alkenyl group, or
- a substituted or unsubstituted C3 to C5 branched alkenyl group,
- at least one of R1, R2, R3, R4, and R5 is
- a fluorine atom,
- a fluorine atom-substituted C1 to C5 linear alkyl group,
- a fluorine atom-substituted C3 to C5 branched alkyl group,
- a fluorine atom-substituted C2 to C5 linear alkenyl group, or
- a fluorine atom-substituted C3 to C5 branched alkenyl group
- X is a halogen atom, and
- M is a niobium atom or a tantalum atom.
An organometallic adduct compound represented by General Formula (I):
- wherein, in General Formula (I),
- R1, R2, R3, R4, and R5 are each independently
- a hydrogen atom,
- a halogen atom,
- a substituted or unsubstituted C1 to C5 linear alkyl group,
- a substituted or unsubstituted C3 to C5 branched alkyl group,
- a substituted or unsubstituted C2 to C5 linear alkenyl group, or
- a substituted or unsubstituted C3 to C5 branched alkenyl group,
- at least one of R1, R2, R3, R4, and R5 is a halogen atom,
- X is a halogen atom, and
- M is a niobium atom or a tantalum atom.
Dependencies are inferred from the claim text.