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US 12,629,726 B2Granted
Apparatus for treating substrate and method for treating a substrate
AssigneeSemes Co., Ltd.
InventorsSung Hun Eom, Tae Won Yun, Ha Neul Yoo, Ji Hyeong Yu
Life of this patent
Estimating the term…
Abstract
The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a support unit configured to support a substrate; and a cleaning unit configured to clean a bottom surface of the substrate supported on the support unit, and wherein the cleaning unit comprises: a body; and a protrusion formed to be upwardly protruding from the body, and the protrusion is positioned to be spaced apart from the bottom surface.
Claims17
A substrate treating apparatus comprising:
- a support configured to support a substrate;
- and
- a cleaner configured to clean a flat bottom surface of the substrate when the substrate is on the support with the flat bottom surface in a horizontal plane, and
- wherein the cleaner comprises,
- a body;
- and
- a protrusion formed to be upwardly and vertically protruding from the body toward the flat bottom surface when the substrate is on the support, the protrusion defining at least one hole in communication with a cleaning liquid supply, the at least one hole being configured to direct a cleaning liquid from the cleaning liquid supply to the flat bottom surface, and
- the protrusion being positioned to be spaced apart from the flat bottom surface, when the substrate is on the support.
5 more elements
A substrate treating apparatus comprising:
- a housing;
- a first support configured to support and rotate a central region of a substrate, the substrate including the central region and an edge central region;
- a second support configured to support and rotate the edge central region of the substrate;
- a treating container configured to surround the substrate on the first support or the substrate supported on the second support within the housing;
- and
- a cleaner configured to clean a bottom surface of the substrate,
- wherein the first support includes a chuck for supporting the central region, and
- the second support comprises,
- a bracket configured to move along a guide rail installed at a sidewall of the housing;
- a plate coupled to the bracket;
- and
- a rotation pin on the plate, the rotation pin being configured to support a side end of the substrate, the rotation pin being configured to rotate the substrate with a lengthwise direction of an up/down direction as an axis, and wherein the cleaner comprises,
- a body;
- a sidewall upwardly extending along a circumferential direction of the body;
- an arm supporting the body;
- a brush positioned at an inner side of an inner wall and upwardly protruding from the body;
- and
- a cleaning liquid supply connected to a hole defined by the body, the cleaning liquid supply being configured to supply a cleaning liquid to the bottom surface, when the substrate is supported on the support, and
- wherein a top end of the brush and a bottom end of the sidewall are each positioned to be spaced apart from the bottom surface.
16 more elements
Dependencies are inferred from the claim text.