Substrate treating apparatus and substrate treating method
AssigneeSemes Co., Ltd.
InventorsYun Sang Kim, Yoon Seok Choi, Young Dae Chung, Soon-Cheon Cho, Se Hoon Oh
Life of this patent
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Abstract
Provided are a substrate treating apparatus and a substrate treating method. The substrate treating apparatus includes: a chamber for providing a processing space; a substrate support unit provided in the processing space to support a substrate and rotate the substrate; a liquid supply unit including a chemical liquid discharge nozzle that discharges a chemical liquid to the substrate supported by the substrate support unit; and a microwave applying member for emitting microwaves to the substrate.
Claims10
An apparatus configured to treat a substrate, the apparatus comprising:
- a chamber defining a processing space;
- a substrate support in the processing space and configured to support a substrate and rotate the substrate;
- a liquid supply including a chemical liquid discharge nozzle configured to discharge a chemical liquid to the substrate supported by the substrate support;
- and
- a microwave emitter configured to emit microwaves to the substrate,
- the substrate support including
- a window made from a layer of material that is horizontally oriented, the window being configured to allow a laser beam emitted from a laser beam emitter to be transmitted to a bottom surface of the substrate;
- a chuck pin configured to support a side portion of the substrate, the chuck pin being configured to space apart the window and the substrate;
- a spin housing coupled to the window, the spin housing defining a vertical path configured to guide the laser beam;
- and
- a driver configured to rotate the spin housing, and
- the microwave emitter being under the window.
An apparatus for treating a substrate, the apparatus comprising:
- a chamber defining a processing space;
- a substrate support in the processing space and configured to support a substrate and rotate the substrate;
- a liquid supply including a chemical liquid discharge nozzle configured to discharge a chemical liquid to the substrate supported by the substrate support;
- and
- a microwave emitter configured to emit microwaves to the substrate,
- wherein the substrate support including
- a window made from a layer of material that is horizontally oriented, the window being configured to allow a laser beam emitted from a laser beam emitter to be transmitted to a bottom surface of the substrate, the layer of material including a dielectric material;
- a chuck pin configured to support a side portion of the substrate, the chuck pin being configured to spaced apart the window and the substrate;
- a spin housing coupled to the window, the spin housing defining a vertical path configured to guide the laser beam;
- and
- a driver configured to rotate the spin housing,
- the microwave emitter being under the window, and
- the microwaves being different depending on a type of membrane quality.
Dependencies are inferred from the claim text.