RF signal parameter measurement in an integrated circuit fabrication chamber
AssigneeLam Research Corporation
InventorsSunil Kapoor, David French, Gary Lemson, Liang Meng
Life of this patent
Estimating the term…
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AssigneeLam Research Corporation
InventorsSunil Kapoor, David French, Gary Lemson, Liang Meng
Estimating the term…
An apparatus to estimate parameters of a radio frequency (RF) signal may include a voltage sensor configured to provide an indication of a voltage of the RF signal as well as a current sensor configured to provide an indication of current conducted by the RF signal. The apparatus may additionally include an analog-to-digital converter coupled to an output port of the voltage sensor and the current sensor, wherein the analog-to-digital converter is configured to provide digital representations of an instantaneous voltage and an instantaneous current of the RF signal. The apparatus may additionally include one or more processors configured to transform the digital representations of the instantaneous voltage and current into frequency domain representations of a complex voltage and complex current.
An apparatus to estimate parameters of a radio frequency (RF) signal coupled to an integrated circuit fabrication chamber comprising a plurality of stations, comprising:
Dependencies are inferred from the claim text.