Plasma processing apparatus
AssigneeDAIHEN Corporation
InventorsRyoji Tamaki, Hayato Notomi, Shigeki Amadatsu, Shinichi Hasegawa
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Abstract
A plasma processing apparatus includes: an inner electrode; an electrode holder; an outer electrode; an insulating member that surrounds the inner electrode and the electrode holder; a fin member for forming a swirling flow around the inner electrode by causing a process gas supplied to an inner side of the insulating member to swirl; and a nozzle that blows the swirling flow converted into a plasma state. The insulating member is directly or indirectly secured to the outer electrode, and the fin member is secured to the electrode holder while being spaced from the inner electrode, and is in contact with an inner circumferential surface of the insulating member.
Claims6
A plasma processing apparatus comprising:
- an inner electrode that receives application of a voltage;
- an electrode holder that surrounds and holds the inner electrode;
- an outer electrode formed in a tubular shape, the outer electrode surrounding the inner electrode and the electrode holder;
- an insulating member arranged between the inner electrode and the outer electrode and between the electrode holder and the outer electrode, the insulating member surrounding the inner electrode and the electrode holder;
- a fin member for forming a swirling flow around the inner electrode by causing a process gas supplied to an inner side of the insulating member to swirl;
- and
- a nozzle that blows the swirling flow converted into a plasma state, wherein
- the insulating member is directly or indirectly secured to the outer electrode, and
- the fin member is secured to the electrode holder while being spaced from the inner electrode, and is in contact with an inner circumferential surface of the insulating member.
Dependencies are inferred from the claim text.