US 12,625,436 B2Granted

Lithography apparatus

AssigneeSamsung Electronics Co., Ltd.

InventorsSung Yong Bae, Hyeon Jin Kim, Jeong-Gil Kim, Kyoung Hwan Oh, Dong Jin Lee

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Abstract

A lithography apparatus comprises a wafer stage, a cable configured to be bent as the wafer stage moves, a first support configured to prevent the cable from sagging, and to support the cable to maintain a bent state of the cable when the cable moves, a first rail installed on a first side of the cable, and including curved track extending in a direction from a lower portion of the cable toward an upper portion of the cable, wherein the first rail includes a concave first surface, a second rail installed on a second side of the cable opposite the first side of the cable, and including curved track extending in the direction from the lower portion of the cable toward the upper portion of the cable, wherein the second rail includes a concave second surface.

Claims20

Dependent claims

A lithography apparatus comprising:

a wafer stage;
a cable connected to the wafer stage;
a first support supporting the cable;
a first rail installed on a first side of the cable, and including a curved track extending in a direction from a lower portion of the cable toward an upper portion of the cable, wherein the first rail includes a concave first surface;
a second rail installed on a second side of the cable opposite the first side of the cable, and including a curved track extending in the direction from the lower portion of the cable toward the upper portion of the cable, wherein the second rail includes a concave second surface;
a first wheel configured to roll along the first surface of the first rail, wherein the first wheel includes a first N pole area and a first S pole area, wherein a surface of the first wheel facing the first surface of the first rail has a curvature;
a second wheel configured to roll along the second surface of the second rail, wherein the second wheel includes a second N pole area and a second S pole area, wherein a surface of the second wheel facing the second surface of the second rail has a curvature;
a first sliding member, wherein the first wheel is mounted on the first sliding member, and is connected to the first support through a first bracket on a side surface of the first sliding member;
and
a second sliding member, wherein the second wheel is mounted on the second sliding member and is connected to the first support through a second bracket on a side surface of the second sliding member,
wherein the first surface of the first rail includes:
a first magnetic area;
a second magnetic area spaced apart from the first magnetic area;
and
a third magnetic area between the first magnetic area and the second magnetic area,
wherein the third magnetic area includes:
a third S pole area vertically overlapping the first N pole area of the first wheel;
and
a third N pole area vertically overlapping the first S pole area of the first wheel,
wherein the second surface of the second rail includes:
a fourth magnetic area;
a fifth magnetic area spaced apart from the fourth magnetic area;
and
a sixth magnetic area between the fourth magnetic area and the fifth magnetic area,
wherein the sixth magnetic area includes:
a fourth S pole area vertically overlapping the second N pole area of the second wheel;
and
a fourth N pole area vertically overlapping the second S pole area of the second wheel.

25 more elements

A lithography apparatus comprising:

a wafer stage;
a cable configured to move while maintaining a bent state thereof as the wafer stage moves;
a first support coupled to the cable and configured to support the cable by moving on the cable as the cable moves;
a first rail disposed on a first side of the cable and including a first track curved along a direction in which the cable is bent;
a second rail disposed on a second side of the cable opposite the first side of the cable and including a second track curved along a direction in which the cable is bent, wherein the first and second rails are arranged parallel to each other;
a first sliding member configured to move along a first surface of the first rail, wherein the first sliding member includes a first body, and a first wheel and a second wheel respectively disposed at both opposing ends of the first body;
a second sliding member configured to move along a second surface of the second rail, wherein the second sliding member includes a second body, and a third wheel and a fourth wheel respectively disposed at both opposing ends of the second body;
a first bracket mounted on a side surface of the first body and connects the first sliding member and the first support to each other;
and
a second bracket mounted on a side surface of the second body and connects the second sliding member and the first support to each other,
wherein the first surface longitudinally extends in a longitudinal direction of the first rail and includes a first magnetic area on a center area of the first surface,
wherein the second surface longitudinally extends in a longitudinal direction of the second rail and includes a second magnetic area on a center area of the second surface,
wherein each of the first surface and the second surface is concave in an inner area thereof,
wherein each of the first to fourth wheels include a convex side surface,
wherein the side surface of each of the first to fourth wheels includes a first area and a second area arranged side by side and extending along a circumference of each of the first to fourth wheels,
wherein the first area and the second area have different magnetic polarities.

13 more elements

A lithography apparatus comprising:

a wafer stage;
a first cable connected to the wafer stage and configured to be bent as the wafer stage moves in a first direction;
a second cable disposed under the first cable and configured to be bent as the wafer stage moves in a second direction intersecting the first direction;
a first support supporting the second cable and configured to prevent the second cable from sagging;
a first rail disposed on a first side of the second cable and including a first track curved along a direction in which the second cable is bent, wherein the first rail includes a concave first surface;
a second rail disposed on a second side of the second cable opposite the first side of the second cable and including a second track curved along a direction in which the second cable is bent, wherein the first and second rails are arranged in parallel with each other, wherein the second rail includes a concave second surface,
a first sliding member configured to move along the first surface of the first rail, wherein the first sliding member includes a first body, and a first wheel and a second wheel respectively disposed at both opposing ends of the first body, wherein each of the first wheel and the second wheel includes a convex surface facing the first surface of the first rail, wherein the first sliding member further includes a first bracket connecting the first body and the first support to each other;
and
a second sliding member configured to move along the second surface of the second rail, wherein the second sliding member includes a second body, and a third wheel and a fourth wheel respectively disposed at both opposing ends of the second body, wherein each of the third wheel and the fourth wheel includes a convex surface facing the second surface of the second rail, wherein the second sliding member further includes a second bracket connecting the second body and the first support to each other,
wherein the first surface includes a first N pole area and a first S pole area longitudinally extending in a longitudinal direction of the first rail, and arranged side by side in a center area of the first surface,
wherein the second surface includes a second N pole area and a second S pole area longitudinally extending in a longitudinal direction of the second rail, and arranged side by side in a center area of the second surface,
wherein each of the first to fourth wheels includes a first area and a second area extending along a circumference thereof and arranged side by side, wherein the first area and the second area have different magnetic polarities,
wherein when each of the first and second wheels rolls along the first surface of the first rail, the first area of each of the first and second wheels contacts the first S pole area, and the second area of each of the first and second wheels contacts the first N pole area,
wherein when each of the third and fourth wheels rolls along the second surface of the second rail, the first area of each of the third and fourth wheels contacts the second S pole area, and the second area of each of the third and fourth wheels contacts the second N pole area,
wherein the first area has N-pole magnetism, and the second area has S-pole magnetism.

12 more elements

Dependencies are inferred from the claim text.

Facts

Application: 18/757,567Filed 28 Jun 2024
Priority: KR 10-2023-013665813 Oct 2023
Published: US 2025/0123573 A117 Apr 2025
Granted: 12 May 2026
Term ends: Not estimatedThe source records don’t support an estimate.

Classification7 codes

G03F 7/70758
Handling of masks or workpieces: drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
B65G 21/22
Means incorporated in, or attached to, framework or housings for guiding load-carriers, traction elements or loads supported on moving surfaces:…
G03F 7/70033
Production of exposure light, i.e. light sources: by plasma extreme ultraviolet [EUV] sources
G03F 7/70716
Handling of masks or workpieces: stages