Method for manufacturing strain sensor by control of thin-film crack using stress concentration structure and strain sensor manufactured using same

A method of manufacturing a strain sensor by control of thin-film crack using a stress concentration structure, the method comprising:

• preparing a solution to be used as a conductive thin-film material for the strain sensor and a flexible substrate to form the strain sensor;
• forming the stress concentration structure on the flexible substrate by repeatedly depositing a micro notch (MN), which is formed to have a structure having a boundary in a two-dimensional plane (xy-plane) or a three-dimensional structure having a tapered boundary in a direction (z-direction) perpendicular to the two-dimensional plane;
• and
• forming the strain sensor by depositing the conductive thin-film on the flexible substrate so as to overlap at least a portion of the micro notch (MN),
• wherein in the forming of the strain sensor by depositing the conductive thin-film, a change in resistance in response to stress in the conductive thin-film is controlled, and
• wherein in the forming of the strain sensor by depositing the conductive thin-film, a length and growth rate of the crack on the conductive thin-film is controlled by adjusting a number and length of micro notches and a thickness of the conductive thin-film.