Plating apparatus
AssigneeEbara Corporation
InventorsMasaki Tomita, Kentaro Yamamoto
Life of this patent
Estimating the term…
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AssigneeEbara Corporation
InventorsMasaki Tomita, Kentaro Yamamoto
Estimating the term…
Provided is a plating apparatus that allows cleaning a contact cleaning member. The plating apparatus includes: a plating tank configured to house a plating solution; a substrate holder configured to hold a substrate with a surface to be plated facing downward, the substrate holder including a contact member for feeding power to the substrate; a contact cleaning member 482 for discharging a cleaning liquid to the contact member while the contact cleaning member is at a cleaning position between the plating tank and the substrate holder; a driving mechanism 476 configured to move the contact cleaning member 482 between the cleaning position and a retracted position retracted from between the plating tank and the substrate holder; and a nozzle cleaning cover 489 configured to cover an upper portion of the contact cleaning member 482 while the contact cleaning member 482 is at the retracted position.
A plating apparatus comprising:
A plating apparatus comprising:
Dependencies are inferred from the claim text.