Surface treatment method
AssigneeASUSTeK COMPUTER INC.
InventorsEr-Bao Niu, Po-Wen Huang, Yu-Chun Yang, Guo-Lin Yang, Tao Chen
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Abstract
A surface treatment method is provided, applicable to a housing. The housing includes a surface. The surface treatment method includes: performing anodic treatment on the surface, to form a microporous structure on the surface; depositing a silicon material on the surface, to form a silicon polymer material layer to fill the microporous structure; and depositing a fluorine-containing monomer material on the surface, where the silicon polymer material layer reacts with the fluorine-containing monomer material to generate a silicon-fluorine polymer mixture structure film to perform pore sealing on the microporous structure.
Claims10
A surface treatment method, applicable to a housing, wherein the housing comprises a surface, and the surface treatment method comprises:
- performing anodic treatment on the surface, to form a microporous structure on the surface;
- depositing a silicon material on the surface, to form a silicon polymer material layer to fill the microporous structure;
- and
- depositing a fluorine-containing monomer material on the surface, wherein the silicon polymer material layer reacts with the fluorine-containing monomer material to generate a silicon-fluorine polymer mixture structure film to perform pore sealing on the microporous structure,
- wherein the step of depositing the silicon material on the surface comprises depositing the silicon material on the surface in a vacuum environment by using a magnetron sputtering process,
- wherein the silicon polymer material is an organosilicon compound with an alternate silicon and oxygen structure, and
- wherein the fluorine-containing monomer material comprises a cyano-fluorine monomer material.
Dependencies are inferred from the claim text.