US 12,624,007 B2 · Naphthalimide sulfonate derivative, and photoacid generator and photoresist composition which comprise same

Abstract

The present invention relates to a naphthalimide sulfonate derivative, and a photoacid generator and a photoresist composition which comprise same, and, more specifically, to a naphthalimide sulfonate derivative compound, and a photoacid generator and a photoresist composition which comprise same, the compound having an excellent absorbance of light with an i-line wavelength (365 nm), having a high solubility in an organic solvent, having excellent thermal stability, and exhibiting a good acid generation rate.

Claims6

Dependent claims

A naphthalimide sulfonic acid derivative compound represented by the following Formula I or II:

wherein, in Formula I, R1 is a substituted or unsubstituted aliphatic hydrocarbon group, a substituted or unsubstituted aryl group, a substituted or unsubstituted arylalkyl group, or a substituted or unsubstituted alkylaryl group;
R2 is hydrogen atom or t-butyl group;
m is an integer of 1 to 4;
n is an integer of 0 to 2;
wherein, in Formula II, R1, m and n are the same as defined in Formula I, and R2 is hydrogen atom.

2 more elements

Dependencies are inferred from the claim text.

Facts

Application

18/028,878Filed 29 Sep 2021

Priority

KR 10-2020-012704229 Sep 2020

Published

US 2023/0331680 A119 Oct 2023

Granted

12 May 2026

Term ends

Not estimatedThe source records don’t support an estimate.

Classification7 codes

C07D 221/14
Ring systems of three rings: aza-phenalenes, e.g. 1,8-naphthalimide
C07D 217/24
With hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals,…:…
G03F 7/004
Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g.…
G03F 7/0045
Photosensitive materials: with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors

Naphthalimide sulfonate derivative, and photoacid generator and photoresist composition which comprise same

Life of this patent

Naphthalimide sulfonate derivative, and photoacid generator and photoresist composition which comprise same

Life of this patent

Abstract

Claims6