Back to results
US 12,623,901 B2Granted
Hierarchical silicon nanostructures, methods of making, and methods of use
AssigneeUniversity of Florida Research Foundation, Inc.
InventorsPeng Jiang, Zhuxiao Gu, Calen Leverant
Life of this patent
Estimating the term…
Abstract
Described herein are antireflective materials and methods of making antireflective materials. The material can include a plurality of hierarchical nanostructures on abase substrate and a total specular reflection of less than 3% at a wavelength of about 400 nm to about 1100 nm. The material can have an etched polyimide layer disposed on the superior surface of the hierarchical nanostructures. The materials can also have superhydrophobic characteristics.
Claims13
A method of making an antireflective material, comprising:
- disposing a mask comprising an array of templating nanoparticles on a top surface of a base substrate by removing the base substrate from a solution having colloidal silica nanoparticles disposed on the surface of the solution, wherein as the base substrate is withdrawn from the solution the array of templating nanoparticles is disposed on the top surface of the base substrate;
- etching the top surface of the base substrate;
- removing the templating nanoparticles, where the removal of the templating nanoparticles forms concave nanoposts;
- disposing a polyimide layer on the concave nanoposts;
- and
- etching the polyimide layer to form hierarchical nanocylinders comprising nanocones in concave nanoposts,
- wherein the base substrate and hierarchical nanocylinders are made of silicon or black silicon, and wherein the antireflective material has a water contact angle of about 130° to about 165°.
4 more elements
A material comprising:
- a plurality of hierarchical nanostructures on a base substrate, wherein the hierarchical nanostructures comprise concave nanoposts filled with a plurality of nanocones, wherein the base substrate and the plurality of hierarchical nanostructures are made of is silicon or black silicon, and wherein the material has a maximal specular reflection between 400 and 800 nm that is less than 3% and wherein the material has a water contact angle of about 130° to about 165°.
Dependencies are inferred from the claim text.