Gas supply unit and substrate processing apparatus including same

A gas supply unit configured to supply a gas of which a temperature or humidity is configured to be controlled to a processing unit configured to process a substrate, the gas supply unit comprising:

• a gas supply housing having a dual chamber structure, and having an internal space in fluid communication with a processing space of the processing unit;
• and
• a gas supply duct configured to supply the gas to the gas supply housing,
• wherein the gas supply housing includes
• a first housing having a first internal space, and
• a second housing in the first internal space, the second housing having a second internal space into which the gas is configured to be introduced from the gas supply duct,
• wherein the second housing includes an injection unit having at least one hole which makes the second internal space and the first internal space be in fluid communication with each other,
• wherein the injection unit has a cylindrical shape,
• wherein the processing unit includes
• a first processing unit and
• a second processing unit below the first processing unit
• wherein the first housing and the second housing are between the first processing unit and the second processing unit,
• wherein a top surface of the first housing is spaced apart from a bottom surface of the first processing unit, and
• wherein the gas supply unit further includes a bolt or a screw made of a heat insulating material, the bolt or the screw fixing the first housing to the first processing unit.

An apparatus for processing a substrate, the apparatus comprising:

• a processing unit configured to form a liquid layer on the substrate by supplying an application liquid to the substrate;
• and
• a gas supply unit configured to supply gas to the processing unit,
• wherein the processing unit includes
• a chamber having a processing space,
• a bowl having a cylindrical shape including an open upper portion,
• a chuck configured to support the substrate in the bowl,
• a driver configured to rotate the chuck,
• a nozzle configured to supply the application liquid to the substrate on the chuck, and
• an exhaust pipe configured to exhaust the gas introduced into the bowl, and the gas supply unit includes
• a gas supply housing having a dual chamber structure, and having an internal space in fluid communication with the processing space, and
• a gas supply duct configured to supply the gas to the internal space,
• wherein the gas supply housing includes
• a first housing having a first internal space in fluid communication with the processing space, and
• a second housing in the first internal space, and the second housing having a second internal space in fluid communication with the first internal space,
• wherein the second housing includes an injection unit having at least one hole in which the gas flows,
• wherein the injection unit has a cylindrical shape,
• wherein the processing unit includes
• a first processing unit and
• a second processing unit below the first processing unit,
• wherein the first housing and the second housing are between the first processing unit and the second processing unit,
• wherein a top surface of the first housing is spaced apart from a bottom surface of the first processing unit, and
• wherein the gas supply unit further includes a bolt or a screw made of a heat insulating material, the bolt or the screw fixing the first housing to the first processing unit.