Methods, systems, and articles for producing a film pattern on a substrate material
AssigneeNIKE, Inc.
InventorsCody Evin Janes, Daniel P. Morgan, Kyle Schepke, Joshua Patrick Williams, Yang-Hua Ou
Life of this patent
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AssigneeNIKE, Inc.
InventorsCody Evin Janes, Daniel P. Morgan, Kyle Schepke, Joshua Patrick Williams, Yang-Hua Ou
Estimating the term…
Aspects herein are directed to systems, methods, and articles for producing a patterned film and using the patterned film to form a pattern of discrete overlay film structures on a substrate material. A uniform thickness of a film material is deposited on to a first surface of a run of carrier sheets, where each carrier sheet includes one or more holes extending there through. A first carrier sheet is extracted from the run of carrier sheets, and a second surface of the carrier sheet is positioned on a substrate material. Heat and/or pressure is applied to the film material to cause the film material to transfer to the substrate material through the one or more holes in the carrier sheet forming a pattern of discrete overlay film structures on the substrate material. The carrier sheet along with remaining portions of the film material is removed from the substrate material.
A method for producing a patterned film, the method comprising:
Dependencies are inferred from the claim text.