Notched wafer and bonding support structure to improve wafer stacking
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsSheng-Chan Li, Cheng-Hsien Chou, Sheng-Chau Chen, Cheng-Yuan Tsai
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Abstract
Various embodiments of the present disclosure are directed towards a processing tool. The processing tool includes a housing structure defining a chamber. A first plate is disposed in the chamber. A first plasma exclusion zone (PEZ) ring is disposed on the first plate. A second plate is disposed in the chamber and underlies the first plate. A second PEZ ring is disposed on the second plate. The second PEZ ring comprises a PEZ ring notch that extends inwardly from a circumferential edge of the second PEZ ring.
Claims20
A processing tool comprising:
- a housing structure defining a chamber;
- a first plate disposed in the chamber;
- a first plasma exclusion zone (PEZ) ring disposed on the first plate;
- a second plate disposed in the chamber and underlying the first plate;
- and
- a second PEZ ring disposed on the second plate, wherein the second PEZ ring comprises a PEZ ring notch that extends inwardly from a circumferential edge of the second PEZ ring, wherein a height of the PEZ ring notch is equal to a height of the second PEZ ring.
A processing tool comprising:
- a housing structure;
- and
- a plate structure disposed within the housing structure and comprising a plasma exclusion zone (PEZ) ring laterally enclosing a plate, wherein the PEZ ring comprises one or more surfaces defining a PEZ notch disposed at an outer region of the plate structure, wherein the PEZ notch underlies a substrate notch of a semiconductor substrate disposed in the housing structure, wherein the one or more surfaces comprise a first sidewall segment adjacent to an outer perimeter of the PEZ ring and a second sidewall segment adjacent to the outer perimeter of the PEZ ring, wherein the first sidewall segment is laterally offset from the second sidewall segment by a lateral distance, wherein the PEZ ring is discontinuous across the lateral distance.
A processing tool comprising:
- a housing structure;
- an upper plate structure disposed within the housing structure and comprising an upper plasma exclusion zone (PEZ) ring disposed around an outer perimeter of an upper plate;
- and
- a lower plate structure disposed within the housing structure and underlying the upper plate structure, wherein the lower plate structure comprises a lower PEZ ring laterally disposed around an outer perimeter of a lower plate, wherein the lower PEZ ring comprises a PEZ ring notch disposed along a circumferential edge of the lower PEZ ring, wherein the PEZ ring notch continuously vertically extends from a top surface of the lower PEZ ring to a bottom surface of the lower PEZ ring.
Dependencies are inferred from the claim text.