Substrate processing apparatus and substrate processing method

A substrate processing apparatus, comprising:

• a holder having thereon a circular attraction surface configured to attract a substrate and including an outer attracting member configured to attract a peripheral portion of the substrate and an inner attracting member configured to attract a portion of the substrate inside the peripheral portion of the substrate attracted by the outer attracting member in a diametrical direction of the circular attraction surface;
• a moving device configured to move the outer attracting member with respect to the inner attracting member;
• and
• a controller configured to control a distortion, which is caused at the substrate attracted to the circular attraction surface, by controlling a movement of the outer attracting member with respect to the inner attracting member,
• wherein the moving device comprises a vertical moving unit configured to move the outer attracting member with respect to the inner attracting member in a vertical direction perpendicular to the circular attraction surface, and
• the controller is further configured to control the distortion of the substrate attracted to the circular attraction surface by controlling a movement of the outer attracting member in the vertical direction.