Remote mapping of circuit speed variation due to process, voltage and temperature using a network of digital sensors

A digital sensor network, comprising:

• a plurality of digital sensors distributed in a tile pattern within an integrated circuit component of an integrated circuit, wherein the plurality of digital sensors comprises:
• a first tile including a plurality of first perimeter digital sensors and a first center digital sensor located at a center of the first tile, wherein adjacent perimeter digital sensors of the plurality of first perimeter digital sensors are separated by a first distance and a distance between the first center digital sensor and a side of the first tile is one-half the first distance;
• and
• a second tile including a plurality of second perimeter digital sensors and a second center digital sensor located at a center of the second tile, wherein adjacent perimeter digital sensors of the plurality of second perimeter digital sensors are separated by the first distance and a distance between the second center digital sensor and a side of the second tile is one-half the first distance, wherein a side length of the first tile and the second tile is substantially equal to a distance over which a condition to be measured by the plurality of digital sensors decays by half.

A method of forming a digital sensor network, the method comprising:

• forming a plurality of digital sensors distributed in a tile pattern within an integrated circuit component of an integrated circuit, wherein the forming of the plurality of digital sensors comprises:
• forming a first tile including a plurality of first perimeter digital sensors and a first center digital sensor located at a center of the first tile, such that adjacent perimeter digital sensors of the plurality of first perimeter digital sensors are separated by a first distance and a distance between the first center digital sensor and a side of the first tile is one-half the first distance;
• and
• forming a second tile including a plurality of second perimeter digital sensors and a second center digital sensor located at a center of the second tile, such that adjacent perimeter digital sensors of the plurality of second perimeter digital sensors are separated by the first distance and a distance between the second center digital sensor and a side of the second tile is one-half the first distance, wherein the forming of the plurality of digital sensors is performed such that a side length of the first tile and the second tile is substantially equal to a distance over which a condition to be measured by the plurality of digital sensors decays by half.