Apparatus for treating substrate and method for aligning dielectric plate using the same

An apparatus for treating a substrate, the apparatus comprising:

• a housing comprising an open top and a treatment space therein;
• a gas supply unit, comprising a gas supply source and a gas supply line, configured to supply a gas to the treatment space;
• a support unit comprising a chuck configured to support the substrate in the treatment space and a lower electrode configured to surround the chuck when viewed from the open top;
• a dielectric plate unit comprising a dielectric plate arranged to oppose the substrate supported by the support unit in the treatment space;
• an upper electrode unit coupled to the dielectric plate unit and comprising an upper electrode arranged to oppose the lower electrode;
• and
• an aligning unit, comprising a body and a plurality of aligning bolts, configured to align a horizontal arrangement of the dielectric plate unit,
• wherein a lid extending from the housing in a horizontal direction and coupled to the upper electrode unit, and
• wherein the lid is provided on the open top of the housing, and the aligning unit is coupled to the lid.