Hybrid multi-source x-ray source and imaging system
AssigneesVarex Imaging Corporation, VEC Imaging GmbH & Co. KG
InventorsHouman Jafari, Bo Gao, Vance Scott Robinson
Life of this patent
Estimating the term…
Abstract
Some embodiments include a system, comprising: at least one x-ray source, each x-ray source including: an electron source configured to generate an electron beam; and a target configured to receive the electron beam and convert the electron beam into an x-ray beam; and a collimator. A first edge of the collimator closest to the electron source is closer to the electron source than a central axis of the x-ray beam before entering the collimator; and a second edge of the collimator opposite to the first edge is at the central axis of the x-ray beam before entering the collimator or closer to the electron source than the central axis of the x-ray beam before entering the collimator.
Claims19
A system, comprising:
- a plurality of x-ray sources comprising:
- a first electron source configured to generate a first electron beam;
- a second electron source configured to generate a second electron beam;
- and
- a target configured to:
- receive the first electron beam and convert the first electron beam into a first x-ray beam;
- and
- receive the second electron beam and convert the second electron beam into a second x-ray beam;
- a collimator;
- a filter downstream of the collimator;
- and
- a first focusing electrode;
- wherein:
- a surface of the target is disposed at an angle relative to the first electron beam that is different from perpendicular;
- a first edge of the collimator closest to the first electron source is closer to the first electron source than a central axis of the first x-ray beam before entering the collimator;
- a second edge of the collimator opposite to the first edge is at the central axis of the first x-ray beam before entering the collimator or closer to the first electron source than the central axis of the first x-ray beam before entering the collimator;
- a first edge of the filter closest to the first electron source has a first thickness;
- a second edge of the filter opposite the first edge of the filter has a second thickness less than the first thickness;
- the first electron source is configured to direct the first electron beam through the first focusing electrode;
- and
- the second electron source is configured to direct the second electron beam to the target without passing through a focusing electrode.
An x-ray system comprising:
- a target;
- a first electron source configured to generate a first electron beam directed toward a first region of the target at a first angle perpendicular to a longitudinal axis of the target;
- a second electron source configured to generate a second electron beam directed toward a second region of the target at a second angle oblique to the longitudinal axis of the target;
- and
- a third electron source configured to generate a third electron beam directed toward the second region of the target at a third angle oblique to the longitudinal axis of the target, wherein:
- at least one of the second electron source or the third electron source is larger or smaller than the first electron source.
An x-ray source comprising:
- a target defining a first region with a first slope relative to a longitudinal axis of the target and a second region with a second slope different from the first slope relative to the longitudinal axis;
- a first electron source configured to generate a first electron beam in a first focal spot in the first region with a first area on the target;
- and
- a second electron source configured to generate a second electron beam in a second focal spot in the second region with a second area on the target, the second area being larger or smaller than the first area, the second area being spatially separated from overlapping the first area, wherein:
- the first slope is angled at a first angle relative to a first axis of the first electron beam;
- the second slope is angled at a second angle relative to a second axis of the second electron beam;
- and
- the second angle is closer to 90° than the first angle.
Dependencies are inferred from the claim text.