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US 12,619,004 B2Granted
Rutile phase tiox deposition with preferred crystal orientations
AssigneeApplied Materials, Inc.
InventorsKenichi Ohno, Takashi Kuratomi
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Abstract
Embodiments of the present disclosure generally relate to optical devices. More specifically, embodiments described herein relate to an optical device layer stack, an optical device formed from the optical device layer stack, and a method of forming an optical device layer stack.
Claims20
A method of forming an optical device layer stack, comprising:
- depositing a titanium containing layer on a substrate;
- thermally treating the titanium containing layer to form an orientation liner on the substrate;
- and
- depositing an optical device layer of titanium oxide over the orientation liner, wherein a rutile phase of titanium oxide is about 100 percent of the optical device layer.
1 more element
An optical device layer stack comprising:
- a substrate having a first surface;
- an orientation liner disposed over the first surface of the substrate;
- and
- an optical device layer disposed over the orientation liner, wherein:
- the orientation liner is formed of a titanium containing material;
- the optical device layer is formed of titanium oxide, the titanium oxide selected from the group consisting of titanium(IV) oxide (TiO2), titanium monoxide (TiO), dititanium trioxide (Ti2O3), Ti3O, Ti2O, δ-TiOx, where x is 0.68 to 0.75, and TinO2n−1, where n is 3 to 9;
- and
- a rutile phase of the titanium oxide is about 100 percent of the optical device layer.
5 more elements
An optical device comprising:
- a substrate having a first surface;
- a plurality of optical device structures disposed over the first surface of the substrate, the plurality of optical device structures spaced apart from each other in a direction parallel to the first surface, wherein
- each optical device structure of the plurality of optical device structures is formed from an orientation liner and an optical device layer disposed on the substrate,
- the orientation liner is formed of a titanium containing material;
- the optical device layer is formed of titanium oxide;
- the titanium oxide in the optical device layer is selected from the group consisting of titanium(IV) oxide (TiO2), titanium monoxide (TiO), dititanium trioxide (Ti2O3), Ti3O, Ti2O, b-TiOx, where x is 0.68 to 0.75, and TinO2n-1, where n is 3 to 9;
- and
- a rutile phase of the titanium oxide is about 100 percent of the optical device layer.
5 more elements
Dependencies are inferred from the claim text.