Silica hollow sphere with a MOF composite layer and method for preparing the same

A method for preparing a silica hollow sphere with a MOF composite layer, comprising the steps of:

• S100:
• pretreating a silica hollow spheres to activate surface hydroxyl groups and obtain a hollow spherical structure made of silica, having an average particle size of 200-800 nm, a wall thickness of 20-50 nm, and a specific surface area of ≥350 m2/g;
• S200:
• aminofunctionalizing the activated silica hollow spheres using a 3-8 wt % y-aminopropyltriethoxysilane solution at pH 4-6, 60-80° C. for 4-8 hours to obtain an amino-silane layer with an amino group density of 2.5-3.2 groups per nm2 and a layer thickness of 1-3 nm;
• S300:
• growing a ZIF-8 crystal layer in situ, with the amino groups serving as nucleation sites, in a methanol solution containing 0.05-0.2 M zinc nitrate and 0.3-0.6 M 2-methylimidazole at 30-40° C. for 8-24 hours to obtain a ZIF-8 crystal layer having a thickness of 50-150 nm, a crystal size of 20-50 nm, and a pore size of 3.3-3.5{acute over (Å)};
• S400:
• reacting the product obtained in step S300 with a 0.3-0.8 M thioacetamide solution at 50-70° C. for 2-6 hours to perform surface thiolation modification, producing a thiol-modified product with a sulfur content of 0.5-2 wt %.